Capabilities
Instrument Specifications
Capabilities Note
Capability | XPS/ESCA | Auger | EDS/EDX | SIMS |
|---|---|---|---|---|
| Principal Input Output | X-rays Electrons | Electrons Electrons | Electrons X-rays | Ions Ions |
| Model | Kratos Axis HSi | PHI 610 | iXRF Model 510D | PHI SIMS II |
| Information | Elemental Chemical Depth profile | Elemental Chemical Depth profile | Elemental Best mapping Line scanning | Elemental (DSIMS) Chemical (SSIMS) Isotopic Depth profile |
| Smallest area | 30 µm diameter | 1 µm diameter | 1-5 µm diameter | 200 µm diameter |
| Largest area | 2 mm x 0.8 mm | 1 mm diameter | 50 x 70 µm | 1 x 1 cm |
| Smallest feature | ~ 25 µm | 0.5 µm | 1 µm | 400 µm |
| Smallest sample | 10 µm (fiber) | 10 µm (fiber) | 1 mm | 10 µm (fiber) |
| Largest Sample | ¼” x 4” 7 mm thick | 2.5 cm diameter 5 mm thick | 2.5-5 cm or 10 cm | 2.5 cm diameter 5 mm thick |
| Analysis depth | 1-10 nm with tilt 3-30 monolayers | 5-10 nm 10-15 monolayers | 1-5 µm @ 20 keV | <3 nm (SSIMS) surface monolayers any depth (DSIMS) |
| Spatial resolution | 10 µm lateral 1 Å depth | 0.2 µm lateral <5 nm depth | 10 nm | 1 mm (SSIMS) 200 µm dyn. Image 5 nm depth |
| Spectral resolution | 0.48 eV; Ag 3d5/2 | dE/E = 0.3% | 145 eV @ Mn | 1 amu |
| Sensitivity | 0.1-1 atom% | 0.1-2 atom% | 0.05-2% | <<1 atom%(DSIMS) |
| Accuracy | ±20% | ±20% | ±5% with standards | ±100% |
| Precision | ±0.5% | ±5% | ±2% | ±1% |
| Best samples | All nonvolatile | Conductors Thin films | Conductive | SSIMS: well ordered polymers DSIMS: oxides |
| Worst samples | Outgassing Nonhomogeneous | Outgassing Thick insulators | Outgassing | Outgassing |
| Best elements | Heavy elements | S, Cl, Ar, K, Pd, Ag, Cd, In, Sn | High Z | Halogen (-ions) Noble metal (+ions) 511 amu max. |
| Worst elements | No H or He Interferences: B/P, Ba/Co, Mn/Ni | No H or He Interferences: S/Mo, N/Ti, Cr/O | Low Z (no Z<B) | Nobel gases High amu |
| Matrix effects | Little | Moderate | Moderate | Large |
| Quantification | Excellent | Good | Good | Good with close standard |
| Analysis time | 20 min – 2 hr | 15 min – 2 hr | 10 min – 1 hr | 15 min – 2 hr |
| Sputter rate | >10 nm/min SiO2@ 2 kV with Ar+ | >10 nm/min SiO2@ 2 kV with Ar+ | N/A | >10 nm/min SiO2@ 2 kV with Ar+ |
| Destructive | No | No | No | Yes |
| Unknown survey | Good | Good | Good | Poor |
| Magnification | 5,000X |
Instrument Specifications
Capabilities Note
| Capability | FTIR | Raman | SEM | FESEM | SPM |
| Principal Input Output | Absorption IR IR | Light Light | Electrons Electrons | Electrons Electrons | AFM & SPM Piezoelectric Feedback |
| Model | Thermo Scientific Nicolet iN10MX | Renishaw RM1000 | JEOL 6400 | JEOL 6320F | Veeco DI Dimension 3100 Nanoscope™ IV |
| Information | Chemical | Chemical | Topographical Atomic # (Z) with backscatter | Topographical | Topographical Magnetic field intensity |
| Smallest area | 10 µm diameter | 1 µm | 1.5 µm diameter | 100 nm | No limit |
| Largest area | 300 µm diameter | 20 µm | 7.5 mm diameter | 100 µm | 125 x 125 µm |
| Smallest feature | 10 µm (5 µm fiber) | 0.5 µm | 10 nm | 1 nm | 5 nm |
| Smallest sample | 10 µm | 0.5 µm | 1 mm | 1 mm | 5 µm |
| Largest Sample | 15 x 30 cm | 2” tall 3” x 3” | 2.5-5 cm or 10 cm | 2.5-5 cm | 1.5 cm diameter x 1 cm high or 15 cm long (Dim 3000) |
| Analysis depth | 2 µm – mms | 2 µm | 2-5 nm | 2-5 nm | 5 µm max. relief |
| Spatial resolution | 1 µm | 10 nm @ 100,000X | 1.2 nm @ 300,000X | <1 nm lateral <1 Å vertical | |
| Spectral resolution | 0.5 cm-1 | 4 cm-1 | |||
| Sensitivity | 1 ppm | 1 pp thousand | 1 Å vertical | ||
| Accuracy | ±2% | ±2% | ±1% or 5 nm | ||
| Precision | ±1% | ±1% | ±2% | ||
| Best samples | Organics Liquids & solids KBr pellets | Organics (double bonds) Solids | Conductive | Conductive Better on insulators than SEM | Smooth |
| Worst samples | Opaque in IR Transparent in IR Multicomponent | Fluorescing Materials Mixtures | Outgassing | Outgassing | Macroscopically rough Mobile surface features |
| Best elements | Requires molecular bonds | Requires molecular bonds | Highest )Z for backscatter | N/A | |
| Worst elements | Weak IR absorber Metal compounds Salts | Metals, Minerals | N/A | ||
| Matrix effects | Water | Mixtures a problem | |||
| Quantification | Poor | Poor | Good | Excellent | Excellent |
| Analysis time | 10-30 min | 30-60 min | 10-30 min | 10-30 min | 30-60 min |
| Destructive | No | Laser may melt samples | No | No | No |
| Unknown survey | |||||
| Magnification | 15-300,000X | 1,000-650,000X | 200,000X |
